Light-sensitive composition for positive-type light-sensitive li

Details Light-sensitive composition for positive-type light-sensitive li Light-sensitive composition for positive-type light-sensitive li

1987-05-13

1989-01-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430191, 430302, 430326, G03C 160, G03F 708

Patent

active

047973463

ABSTRACT:
A light-sensitive composition for use in the preparation of positive-type light-sensitive lithographic printing plate which comprises an o-naphthoquinone diazide compound and novolak resin in which the novolak resin comprises two different novolak resins each being prepared by the polycondensation or co-polycondensation of an aldehyde with at least one compound selected from the group consisting of phenol, m-cresol, o-cresol and p-cresol.

REFERENCES:
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patent: 4123279 (1978-10-01), Kobayashi
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4404357 (1983-09-01), Taylor et al.
patent: 4424315 (1984-01-01), Taylor et al.
patent: 4442195 (1984-04-01), Yamamoto et al.
patent: 4551409 (1985-11-01), Gulla et al.

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