Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-03-31
1994-08-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430157, 430176, 430281, 430283, 430284, 430288, 430906, G03F 7021
Patent
active
053406850
ABSTRACT:
A light-sensitive composition comprises a light-sensitive diazo resin, a polymer binder and a fluorine atom-containing surfactant, wherein the polymer binder is a polyurethane resin having acidic hydrogen atom-containing substituents and comprising structural units derived from a diol represented by the following general formula (I); and the fluorine atom-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group which has a carbon atom number of 3 to 20 and a fluorine atom content of not less than 30% by weight and in which at least three terminal carbon atoms are completely fluorinated, with (ii) poly(oxyalkylene) acrylate or poly(oxyalkylene)methacrylate, the copolymer containing the fluoroaliphatic group-containing acrylate or methacrylate units in an amount ranging from 35 to 50% by weight on the basis of the weight of the copolymer and the copolymer having has a molecular weight ranging from 20,000 to 100,000:
REFERENCES:
patent: 4822713 (1989-04-01), Nishioka et al.
patent: 4983491 (1991-01-01), Aoai et al.
patent: 5279917 (1994-01-01), Adachi et al.
WPIL Week 8930, Sep. 1989, 89-217737/30 and JPA-1-156737.
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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