Light sensitive composition containing an arylhydrazo dye

Details Light sensitive composition containing an arylhydrazo dye Light sensitive composition containing an arylhydrazo dye

1996-09-30

1998-06-09

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, 4302701, 430326, 430330, G03F 7023, G03F 732

Patent

active

057631352

ABSTRACT:
A light-sensitive positive photoresist composition containing a film forming resin, a photoactive compound, a solvent, and an arylhydrazo dye. The dyed photoresist reduces the linewidth variation of the resist pattern on a reflective substrate while giving good lithographic performance.

REFERENCES:
patent: 3869292 (1975-03-01), Peters
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4927732 (1990-05-01), Merrem et al.
patent: 5043243 (1991-08-01), Yajima et al.
patent: 5108870 (1992-04-01), Shalom
patent: 5354644 (1994-10-01), Yamamoto et al.
"Chemistry and Application of Phenolic Resins", Knop A. and Scheib, W.; Springer Verlag, NY 1979 Chapter 4.
"Light Sensitive Systems", Kosar, J.; John Wiley & Sons, NY, 1965, Chapter 7.4.

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