Light-sensitive composition comprising a polysiloxane and a naph

Details Light-sensitive composition comprising a polysiloxane and a naph Light-sensitive composition comprising a polysiloxane and a naph

1990-07-23

1992-09-01

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 430278, 528 26, 528 27, 528 28, 528 32, G03F 7023, G03F 7075, C08G 7704, C08G 7720

Patent

active

051438160

ABSTRACT:
A light-sensitive composition comprising:
(a) a polysiloxane compound having at least 1 mol % of a structural unit derived from a product of a thermal cycloaddition reaction between a compound of formula (I), (II), (III) or (IV) and a compound of formula (V), (VI), (VII) or (VIII), and
(b) an orthoquinonediazide compound. ##STR1##

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patent: 4837339 (1989-06-01), Sato
patent: 4865945 (1989-09-01), Noguchi et al.
patent: 5008362 (1991-04-01), Wilharm et al.
patent: 5015700 (1991-05-01), Herzig et al.

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