Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-05-04
1994-01-18
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430175, 430176, 430191, 430192, 430193, 430278, 430281, 430283, 430284, 430288, G03F 7016, G03F 7023, G03F 7027, G03C 177
Patent
active
052799174
ABSTRACT:
A light-sensitive composition comprises a light-sensitive compound, an alkali soluble resin and a fluorine-containing surfactant. The surfactant is a copolymer of a (poyoxyalkylene)acrylate or (polyoxyalkylene)methacrylate with an acrylate or methacrylate having a fluorine-containing aliphatic group. The copolymer has a weight average molecular weight of 1000 to 6000 and contains the acrylate or methacrylate in an amount of 10 to 25% by weight. The fluorine-containing aliphatic group has 6 to 20 carbon atoms and 30% or more by weight of fluorine atoms.
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Adachi Yutaka
Nakai Hideyuki
Tanaka Takeshi
Bowers Jr. Charles L.
Chu John S.
Konica Corporation
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