Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1986-06-06
1988-05-03
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, G03C 152
Patent
active
047419857
ABSTRACT:
A light-sensitive composition comprising a diazonium compound and a polymer having the recurring units represented by the following general formula (I): ##STR1## wherein R.sub.1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R.sub.2 represents an unsubstituted alkyl group; R.sub.3 represents an aliphatic or aromatic hydrocarbon group having a carboxyl group; R.sub.4 represents an aliphatic or aromatic hydrocarbon group which has at least one hydroxyl or nitrile group and which may be further substituted; n.sub.1, n.sub.2, n.sub.3, n.sub.4 and n.sub.5 represent the molar percents of the respective recurring units, provided that n.sub.1 is from about 5 to about 85 mol %, n.sub.2 is from 0 to about 60 mol %, n.sub.3 is from 0 to about 20 mol %, n.sub.4 is from about 3 to about 60 mol % and n.sub.5 is from greater than 0 to about 60 mol %.
REFERENCES:
patent: 3396019 (1968-08-01), Uhlig
patent: 4123276 (1978-10-01), Kita et al.
patent: 4467027 (1984-08-01), Yamamoto et al.
patent: 4631245 (1986-12-01), Pawlowski
Aoai Toshiaki
Kamiya Akihiko
Maemoto Kazuo
Sekiya Toshiyuki
Fuji Photo Film Co. , Ltd.
Michl Paul R.
Stevenson Terri
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