Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-05-16
1992-05-12
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430281, 430287, G03C 160
Patent
active
051127431
ABSTRACT:
Disclosed is a novel diazo resin which has at least one repeating unit represented by the following general formula (I): ##STR1## wherein R.sup.2 represents a hydrogen atom, an alkyl group or an alkoxy group, a hydroxyl group, a carboxy ester group or a carboxyl group: R.sup.1 represents a carboxyl group or a group having at least one carboxyl group; R.sup.3 and R.sup.4 each represents a hydrogen atom or an alkyl group or an alkoxy group; X.sup.31 represents an anion; and Y represents --NH--, --O-- or --S--. The diazo resin is useful for a presensitized plate for use in making a lithographic printing plate when it is incorporated into a light-sensitive layer or an underlayer on a substrate. According to the present invention, a presensitized plate using the diazo resin has excellent properties such as high sensitivity, good adhesion between the substrate and the light-sensitive layer and can thus provide a lithographic printing plate having a high printing durability and free of background contamination.
REFERENCES:
patent: 4021243 (1977-05-01), Steppan et al.
patent: 4334006 (1982-06-01), Kitajima et al.
patent: 4492748 (1985-01-01), Lutz et al.
patent: 4731316 (1988-03-01), Tomiyasu et al.
patent: 4845009 (1989-07-01), Kita et al.
Imai Masanori
Kamiya Akihiko
Koike Akinobu
Fuji Photo Film Co. , Ltd.
Michl Paul R.
Young Christopher
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