Light-sensitive composition and light-sensitive lithographic pri

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430165, 430191, 430192, G03F 7023

Patent

active

057232539

ABSTRACT:
Disclosed is a light-sensitive composition containing an o-quinonediazide compound, a novolak resin and a polymer,

REFERENCES:
patent: 3181461 (1965-05-01), Fromson
patent: 3511661 (1970-05-01), Rauner et al.
patent: 4910119 (1990-03-01), Schneller et al.
patent: 5275908 (1994-01-01), Elsaesser et al.
patent: 5332650 (1994-07-01), Murata et al.

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