Light-sensitive composition and light-sensitive lithographic pri

Details Light-sensitive composition and light-sensitive lithographic pri Light-sensitive composition and light-sensitive lithographic pri

1995-12-04

1998-03-03

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430192, G03F 7023

Patent

active

057232539

ABSTRACT:
Disclosed is a light-sensitive composition containing an o-quinonediazide compound, a novolak resin and a polymer,

REFERENCES:
patent: 3181461 (1965-05-01), Fromson
patent: 3511661 (1970-05-01), Rauner et al.
patent: 4910119 (1990-03-01), Schneller et al.
patent: 5275908 (1994-01-01), Elsaesser et al.
patent: 5332650 (1994-07-01), Murata et al.

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