Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1987-08-10
1989-06-20
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430175, 430177, 430179, 430190, 430194, 430196, 430270, 430280, 430281, 430343, 430916, 430920, 430925, G03C 160, G03C 168, G03C 149, G03C 1727
Patent
active
048408697
ABSTRACT:
Light sensitive compositions are disclosed which comprise 2-halomethyl-1,3,4,-oxadiazole compounds having a heterocyclic radical in the fifth position containing at least one element selected from the group consisting of oxygen, nitrogen, sulphur, and selenium directly or through a vinyl radical.
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Goto Kiyoshi
Kita Noriyasu
Bowers Jr. Charles L.
Konishiroku Photo Industry Co,., Ltd.
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