Light-sensitive composition

Details Light-sensitive composition Light-sensitive composition

1993-08-16

1995-06-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430302, 430910, 430157, G03C 160

Patent

active

054278872

ABSTRACT:
Disclosed is a light-sensitive composition which comprises
(A) a diazo resin and
(B) an alkali-soluble and swellable polymer compound, said polymer compound being a vinyl copolymer containing, as a constitutional unit, 0.1 to 10 mole % of a structure derived from an ester of acrylic acid or methacrylic acid having an alkyl group with 8 or more carbon atoms.

REFERENCES:
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patent: 2679498 (1954-05-01), Seven et al.
patent: 2714066 (1955-07-01), Jewett et al.
patent: 2946683 (1960-07-01), Mellan et al.
patent: 3181461 (1965-05-01), Fromson
patent: 3220832 (1965-11-01), Uhlig
patent: 3930865 (1976-01-01), Faust et al.
patent: 4123276 (1978-10-01), Kita et al.
patent: 4172729 (1979-10-01), Naritomi et al.
patent: 4179292 (1979-12-01), Klupfel et al.
patent: 4275138 (1981-06-01), Kita et al.
patent: 4304832 (1981-12-01), Ohta et al.
patent: 4929532 (1990-05-01), Dundes
patent: 5112743 (1992-05-01), Kamiya et al.
Derwent Abstract of 054281720 DE-A-2437408 (Feb. 1975).

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