Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-03-31
1990-08-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 5, 430155, 430157, 430165, 430191, 430192, 430278, 430281, 430302, 430326, 430906, G03C 160
Patent
active
049505823
ABSTRACT:
A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.
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Aoai Toshiaki
Aoshima Keitaro
Okamoto Yasuo
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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