Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1983-05-23
1985-01-15
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 5, 430165, 430190, 430191, 430302, 430311, 430326, 430331, G03C 160, G03F 708
Patent
active
044938845
ABSTRACT:
A light-sensitive composition containing a high molecular compound and a light-sensitive o-naphthoquinonediazide compound is disclosed. The high molecular compound includes a structure unit represented by the general formula (I): ##STR1## wherein R is a hydrogen atom or a methyl group, and Y is a phenylene group, a substituted phenylene group, a naphthylene group or a substituted naphthylene group. The light-sensitive composition makes possible the production of a light-sensitive material which can be developed under a wide range of development conditions to provide a lithographic printing plate having high printing durability.
REFERENCES:
patent: 3869292 (1975-03-01), Peters
patent: 4139384 (1979-02-01), Iwasaki et al.
patent: 4294905 (1981-10-01), Okishi et al.
Pacansky, J., IBM Technical Disclosure Bulletin, vol. 20, No. 7, 12/77, p. 2809.
Nagano Teruo
Nagashima Akira
Bowers Jr. Charles L.
Fuji Photo Film Co. , Ltd.
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