Light-sensitive composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430 5, 430165, 430190, 430191, 430302, 430311, 430326, 430331, G03C 160, G03F 708

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active

044938845

ABSTRACT:
A light-sensitive composition containing a high molecular compound and a light-sensitive o-naphthoquinonediazide compound is disclosed. The high molecular compound includes a structure unit represented by the general formula (I): ##STR1## wherein R is a hydrogen atom or a methyl group, and Y is a phenylene group, a substituted phenylene group, a naphthylene group or a substituted naphthylene group. The light-sensitive composition makes possible the production of a light-sensitive material which can be developed under a wide range of development conditions to provide a lithographic printing plate having high printing durability.

REFERENCES:
patent: 3869292 (1975-03-01), Peters
patent: 4139384 (1979-02-01), Iwasaki et al.
patent: 4294905 (1981-10-01), Okishi et al.
Pacansky, J., IBM Technical Disclosure Bulletin, vol. 20, No. 7, 12/77, p. 2809.

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