Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-09-07
1990-07-17
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430285, 430326, 430306, 525350, 5253295, G03C 152, G03F 7016
Patent
active
049421093
ABSTRACT:
A light-sensitive composition which is developable with an aqueous alkaline solution, comprising (a) at least one light-sensitive resin obtained by adding an active mercaptocarboxylic acid to a part of carbon-carbon unsaturated bonds of a polymer having at least two photodimerizable unsaturated double bonds adjacent to an aromatic nucleus in the main chain thereof and (b) optionally at least one negative-working diazo resin. The light-sensitive composition makes it possible to prepare a light-sensitive plate capable of developing with an aqueous alkaline solution without forming insoluble substances in the developer during the development and the adhesive force between the substrate and the light-sensitive layer of the plate is increased, which in turn substantially improves the printing durability of the lithographic printing plate as a final product.
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Kita Nobuyuki
Koizumi Shigeo
Fuji Photo Film Co. , Ltd.
Michl Paul R.
Rodee Christopher D.
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