Light-sensitive composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430285, 430326, 430306, 525350, 5253295, G03C 152, G03F 7016

Patent

active

049421093

ABSTRACT:
A light-sensitive composition which is developable with an aqueous alkaline solution, comprising (a) at least one light-sensitive resin obtained by adding an active mercaptocarboxylic acid to a part of carbon-carbon unsaturated bonds of a polymer having at least two photodimerizable unsaturated double bonds adjacent to an aromatic nucleus in the main chain thereof and (b) optionally at least one negative-working diazo resin. The light-sensitive composition makes it possible to prepare a light-sensitive plate capable of developing with an aqueous alkaline solution without forming insoluble substances in the developer during the development and the adhesive force between the substrate and the light-sensitive layer of the plate is increased, which in turn substantially improves the printing durability of the lithographic printing plate as a final product.

REFERENCES:
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patent: 4084020 (1978-04-01), Mathias et al.
patent: 4179531 (1979-12-01), Hein et al.
patent: 4415651 (1983-11-01), Proskow
patent: 4431723 (1984-02-01), Proskow
patent: 4640887 (1987-02-01), Nakamura et al.
patent: 4684601 (1987-08-01), Nakamura et al.

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