Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1983-08-02
1985-08-06
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430143, 430175, 430293, 430300, 430302, 430325, 534558, 534561, 534564, G03C 154, G03F 708, C07C11304
Patent
active
045336202
ABSTRACT:
Light sensitive condensed copolymers or multi-polymers of at least two distinct diazonium salts of the types specified herein. The product is characterized by high light speed, good shelf life and very good resistance to thermal and electrical degradation.
REFERENCES:
patent: 3406159 (1968-10-01), Steppan et al.
patent: 3849392 (1974-11-01), Steppan
patent: 3867147 (1975-02-01), Teuscher
patent: 4132553 (1979-01-01), Burkle et al.
patent: 4288520 (1981-09-01), Sprintschnik
patent: 4299907 (1981-11-01), Burkle et al.
patent: 4414311 (1983-11-01), Walls et al.
Dunder Thomas A.
Walls John E.
American Hoechst Corporation
Bowers Jr. Charles L.
Roberts Richard S.
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