Light sensitive alkali developable photoresist material with flu

Details Light sensitive alkali developable photoresist material with flu Light sensitive alkali developable photoresist material with flu

1987-03-30

1989-02-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430160, 430167, 430271, G03C 174, G03C 154, G03C 168

Patent

active

048031453

ABSTRACT:
A light-sensitive image-forming material which has on a support a coloring layer comprising a coloring agent and an alkali soluble organic macromolecular binder, and a photopolymer layer, in the order listed, with the coloring layer further containing a particular fluorine-containing surface active agent, whereby uniform film thickness is ensured to the coloring layer even when drying is carried out in a short time using simple equipment. The fluorine-containing surface active agent is a copolymer comprising as repeating units (1) an acrylate or a methacrylate which has a fluorinated alphatic group containing from 3 to 20 carbon atoms and not less than 40 wt % of fluorine atoms, with the aliphatic group having a terminal moiety containing at least 3 fluorinated carbon atoms, and (2) a poly(oxyalkylene)acrylate or a poly(oxyalkylene)methacrylate. In addition, the portion of the fluorinated aliphatic group-containing acrylate or methacrylate repeating unit is from 10 to 70% by weight.

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