Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-09-28
1984-07-03
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430189, 430192, 430193, 430270, 430280, 430342, 430344, G03C 160, G03C 154, G03C 172
Patent
active
044579993
ABSTRACT:
Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a.sup.1) a compound forming an acid on exposure and (a.sup.2) a compound having at least one C--O--C bond cleavable by acid; (b) a water-insoluble binder soluble in aqueous-alkaline solutions; (c) an organic compound forming an acid on exposure of the general formula I ##STR1## in which X is a single bond or one of the groups CO, SO.sub.2, N=N or CR.sup.7 R.sup.8, R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are hydrogen atoms, halogen atoms or nitro groups, with not more than two of these radicals being hydrogen atoms and at least one thereof being a nitro group, R.sup.5 and R.sup.6 are hydrogen atoms or 1,2-naphthoquinone-2-diazide-4-sulfonyloxy radicals, with R.sup.5 and R.sup.6 being always different from each other, and R.sup.7 and R.sup.8 are hydrogen atoms or lower alkyl radicals, and (d) an azo dyestuff containing at least one nitro group in the molecule. Also disclosed are printing plates and photoresists prepared with the light-sensitive mixtures.
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Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
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