Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid mon

Details Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid mon Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid mon

1987-07-01

1989-01-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 534557, G03C 154, G03C 176, C07C11300

Patent

active

047973455

ABSTRACT:
Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoester of a cycloalkyl-substituted phenol corresponding to the formula: ##STR1## wherein n is from about 2 to about 10 and their use in light-sensitive mixtures (e.g. positive-working photoresist compositions) also containing alkali-soluble resins such as phenol-formaldehyde novolaks and cresol-formaldehyde novolaks as well as substrates coated therewith.

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patent: 4551409 (1985-11-01), Gulla et al.
patent: 4670372 (1987-06-01), Lewis et al.

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