Patent
1980-05-12
1982-04-20
Edlow, Martin H.
357 30, H01L 2980
Patent
active
043262104
ABSTRACT:
A field effect semiconductor device comprises a P-N junction with a depletion layer responsive to radiant energy for controllably enabling the field effect semiconductor device. The depletion layer occurs near at least a pair of gate locations within a silicon substrate. The gate locations are of P-type while the silicon substrate is of N-type. The depletion layer is rendered ineffective by photoelectromotive force derived from the radiant energy. A channel emerges according to the shrinkage of the depletion layer to thereby provide electrical connection between a source and drain electrodes of the field effect transistor.
REFERENCES:
patent: 3894295 (1975-07-01), Shannon
patent: 3931633 (1976-01-01), Shannon
patent: 4115793 (1978-09-01), Nishizawa
Aso Akira
Kawanabe Hitoshi
Edlow Martin H.
Sharp Kabushiki Kaisha
LandOfFree
Light-responsive field effect mode semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Light-responsive field effect mode semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light-responsive field effect mode semiconductor devices will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1265556