Light irradiation type thermal processing apparatus

Electric resistance heating devices – Heating devices – Radiant heater

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C392S418000, C219S390000, C219S405000, C219S411000

Reexamination Certificate

active

06856762

ABSTRACT:
In a light diffuser, a strong light diffusion processing is performed to a lamp corresponding part located in a vertical immediate downward direction of each of a plurality of flash lamps, and a weak light diffusion processing is performed to an inter-lamp corresponding part located between lamp corresponding parts adjacent to each other. Thereby, the light transmittance of the lamp corresponding part is lower than that of the inter-lamp corresponding part. Light that is emitted from each of the flash lamps and directed to a vertical immediate downward direction is diffused intensely, while reducing the degree of light diffusion at a location immediately below space between the adjacent flash lamps, thereby improving in-plane uniformity of illumination distribution on a semiconductor wafer. This enables to provide a thermal processing apparatus capable of improving in-plane uniformity of illumination distribution on a substrate.

REFERENCES:
patent: 4571486 (1986-02-01), Arai et al.
patent: 4649261 (1987-03-01), Sheets
patent: 6437290 (2002-08-01), Shao et al.
patent: 57-162340 (1982-10-01), None
patent: 59-169125 (1984-09-01), None
patent: 60-258928 (1985-12-01), None
patent: 63-166219 (1988-07-01), None
patent: 2001-237195 (2001-08-01), None
patent: 2002-110579 (2002-04-01), None
patent: 2002-110580 (2002-04-01), None
English translation of Abstract for Japanese Patent Application Laid Open No. 2002-110579.
English translation of Abstract for Japanese Patent Application Laid Open No. 2002-110580.
English translation of Abstract for Japanese Patent Application Laid Open No. 2001-237195.
English translation of Abstract for Japanese Patent Application Laid Open No. 57-162340.
English translation of Abstract for Japanese Patent Application Laid Open No. 63-166219.
Japanese Patent Application Laid Open No. 59-169125 which corresponds to U.S. Patent No. 4,571,486 (as listed above).
Japanese Patent Application Laid Open No. 60-258928 which corresponds to U.S. Patent No. 4,649,261 (as listed above).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Light irradiation type thermal processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light irradiation type thermal processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light irradiation type thermal processing apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3501682

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.