Light irradiation apparatus, light irradiation method,...

Optical: systems and elements – Optical modulator – Light wave temporal modulation

Reexamination Certificate

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C359S238000

Reexamination Certificate

active

11051189

ABSTRACT:
A light irradiation apparatus includes a light modulation element which modulates a phase of an incident light beam to obtain a V-shaped light intensity distribution having a bottom portion of a minimum light intensity, and an image formation optical system which applies the modulated light beam from the light modulation element to an irradiation target surface in such a manner that the V-shaped light intensity distribution is provided on the irradiation target surface. The light modulation element has such a complex amplitude transmittance distribution that a secondary derivative of a phase value of a complex amplitude distribution becomes substantially zero at the bottom portion of the V-shaped light intensity distribution in an image space of the image formation optical system.

REFERENCES:
Masakiyo Matsumura, “Preparation of Ultra-Large Grain Silicon Thin-Films by Excimer-Laser”, Journal of the Surface Science Society of Japan, vol. 21, No. 5, 2000, pp. 278-287.
H. Ogawa, et al., “Growth of Large Si Grains at Room Temperature by Phase-Modulated Excimer-Laser Annealing Method”, IDW'03 Proceedings of the 10thInternational Display Workshops, pp. 323-326.

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