Light guide arrangement with scanning tip to resist uneven wear

Details Light guide arrangement with scanning tip to resist uneven wear Light guide arrangement with scanning tip to resist uneven wear

1973-11-19

1976-01-13

Lieberman, Eli

Radiant energy

Ionic separation or analysis

Static field-type ion path-bending selecting means

250227, G02B 514

Patent

active

039320227

ABSTRACT:
A light guide arrangement in which at least two light guides are coupled at one end to an optical integration Chamber for achieving a common field of view from the remote ends of both or all of the light guides even when the end of the optical integration chamber is in contact with a surface being scanned, in which the components of the optical integration chamber, that is a light guiding element, a sheath of optically insulating material, and an outer cladding are held together by a bond which does not involve the use of a bonding material, to attenuate the problems due to wear of the scanning end of the optical integration chamber. The scanning tip of the integration chamber may be drawn to a point during or after the bonding to form a well defined scanning point.

REFERENCES:
patent: 3350654 (1967-10-01), Snitzer
patent: 3509353 (1970-04-01), Sundblad et al.
patent: 3781555 (1973-12-01), Keefe

Affiliated with

Also associated with

Rating

Light guide arrangement with scanning tip to resist uneven wear does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light guide arrangement with scanning tip to resist uneven wear, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light guide arrangement with scanning tip to resist uneven wear will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-743322