Light exposure mask for semiconductor devices and method for for

Details Light exposure mask for semiconductor devices and method for for Light exposure mask for semiconductor devices and method for for

1996-06-27

1998-06-02

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, G03F 900

Patent

active

057597235

ABSTRACT:
A light exposure mask which is used in the formation of a micro pattern, including a transparent substrate, a chromium pattern formed on the transparent substrate, and assistant patterns formed on portions of the chromium pattern where a rounding effect is generated. By virtue of the assistant patterns, it is possible to prevent the phenomenon that the pattern is reduced in size due to the rounding effect. Accordingly, it is possible to accurately form a pattern having a desirable size. Each assistant pattern has a bar, inverted-triangular or inverted-U shape.

REFERENCES:
patent: 4936951 (1990-06-01), Hashimoto et al.
patent: 5057462 (1991-10-01), Eisenberg et al.
patent: 5585210 (1996-12-01), Lee et al.
patent: 5605775 (1997-02-01), Watanabe

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