Light exposure apparatus and method of light exposure using...

Details Light exposure apparatus and method of light exposure using... Light exposure apparatus and method of light exposure using...

2008-06-24

2008-06-24

Lee, Diane I (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

Reexamination Certificate

active

07391500

ABSTRACT:
In view of stably forming resist patterns with an excellent resolution, a light exposure apparatus100comprises a light source101irradiating a mask102with light, a projection optical system103projecting an image of the mask102onto a wafer110, and a liquid supply unit105filling a liquid medium109between the projection optical system103and the wafer110. A saturated cyclic hydrocarbon or its derivative is used as the liquid medium109.

REFERENCES:
patent: 4000181 (1976-12-01), Elliott et al.
patent: 6291566 (2001-09-01), Shin et al.
patent: 2005/0202351 (2005-09-01), Houlihan et al.
patent: 2005/0286031 (2005-12-01), French et al.
patent: 7-220990 (1995-08-01), None
patent: WO 2005/119371 (2005-12-01), None
U.S. Appl. No. 60/575,982, filed Jun. 2004, French et al.

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