Light exposure and illuminating apparatus

Details Light exposure and illuminating apparatus Light exposure and illuminating apparatus

1995-07-14

1997-09-30

Phan, James

Optical: systems and elements

Deflection using a moving element

359208, 359212, 359216, 355 67, G02B 2608

Patent

active

056731345

ABSTRACT:
A light exposure illuminating apparatus is provided which, employing harmonics of a continuously outputted laser beam, is small-sized, inexpensive and free from speckles and which achieves a high light source utilization efficiency. Specifically, a harmonics generating 1 generates light with fourth harmonics which are scanned by a scanning lens 2 and reflected and swept by a polygonal mirror 3. A cylindrical reflecting mirror radiates the sweeping fourth harmonics reflected by the polygonal mirror 3 onto an arcuate aperture formed in a light exposure mask. The light of fourth harmonics transmitted through the arcuate aperture reaches a reticle 7 set on a semiconductor pattern. The illuminating light passed through the reticle 7 is projected onto a wafer 9 via a concave mirror 5 and a convex mirror 76. The area of light exposure may be increased since the reticle 7 and the wafer 9 are moved in synchronism with the scanning of the scanning optical system.

REFERENCES:
patent: 3520586 (1970-07-01), Bousky
patent: 5416630 (1995-05-01), Ito et al.
patent: 5473409 (1995-12-01), Takeda et al.
patent: 5528027 (1996-06-01), Mizutani

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