Light emitting element with employment of porous silicon and opt

Active solid-state devices (e.g. – transistors – solid-state diode – Bulk effect device – Bulk effect switching in amorphous material

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257 52, 257 59, 257 96, 257103, H01L 3300

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active

052850781

ABSTRACT:
A carrier injection type light emitting element with employment of a pn junction established between porous silicon and a semiconductor having a conductivity type different from that of the porous silicon, and also optical devices such as an opto-optical converting element, a light transmitting element, a photocoupling circuit element, a photocoupling element and a display apparatus, which comprise such a carrier injection type light emitting element and a semiconductor light receiving element.

REFERENCES:
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Canham, "Silicon Quantum Wire Array Fabrication by Electrochemical and Chemical Dissolution of Wafers," Appl. Phys. Lett. 57(10), 3 Sep. 1990, pp. 1046-1048.
Halimaoui et al., "Electroluminescence in the Visible Range During Anodic Oxidation of Porous Silicon Films," Appl. Phys. Lett. 59(3), 15 Jul. 1991, pp. 304-306.
Lehmann et al., "Porous Silicon Formation: A Quantum Wire Effect," Appl. Phys. Lett. 58(8), 25 Feb. 1991, pp. 856-858.
Richter et al., "Current-Induced Light Emission From A Porous Silicon Device," IEEE Electron Device Letters, vol. 12, No. 12, Dec. '91, pp. 691-692.
Paasche et al., "Amorphous-SiC Thin-Film P-i-N Light-Emitting Diode Using Amorphous-SiN Hot-Carrier Tunneling Injection Layers," IEEE Transactions on Electron Devices, vol. 36, No. 12, Dec. 1989, pp. 2895-2901.
Silicon Quantum Wire Array Fabrication By Electrochemical and Chemical Dissolution Of Wafers, L. T. Canham, pp. 1046-1048, Appl. Phs. Lett. vol. 57, No. 10, Sep. 3, 1990.
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Visible Light Emission From Quantized Planar Ge Structures, Venkatasubramanian et al., Appl. Phs. Lett. 59(13), Sep. 23, 1991, pp. 1603-1605.
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Applied Physics Letters 57(10), 3 Sep. 1990, pp. 1046-1048, "Physics on Optical/Electronic Integrated Circuit", H. Matsueda, pp. 279-309.

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