Light emitting diode formed of a compound semiconductor material

Coherent light generators – Particular component circuitry – Optical pumping

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357 16, 372 45, 372 46, H01L 3300

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047061014

ABSTRACT:
A light emitting diode is disclosed which includes an N-GaAs substrate, a double hetero-junction structure obtained by forming an N-GaAlAs clad layer, a P-GaAs active layer and a P-GaAlAs clad layer on the substrate in that order, and a current narrowing structure obtained by selectively forming a contact metal on the P-GaAlAs clad layer in the double hetero-junction structure with the contact metal formed around the contact metal. In the light emitting diode so manufactured, the double hetero-junction structure is formed by a metal organic vapor deposition method. The N-GaAlAs clad layer is of a three-layer structure with one layer of a narrower forbidden band width sandwiched between the remaining two layers of a wider forbidden band width.

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Materials Letters, vol. 2, No. 3, Feb. 1984, pp. 184-188, Amsterdam, NL; S. Mahajan et al., "The Origin of Dark Spot Defects in InP/InGa As P Aged Light Emitting Diodes", FIG. 1, p. 184, last paragraph.
Applied Physics Letters, vol. 43, No. 1, Jul. 1, 1983, pp. 103-105, New York (US), K. Mohammed et al.: "Effects of V/III Variation on the Optical Properties of GaAs and GaACAs Grown by Metalorganic Chemical Vapor Deposition".
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Japanese Journal of Applied Physics, vol. 22, No. 7, part 2, Jul. 1983, pp. L450-L451, Tokyo (JP), Y. Shinoda et al.: "GaAs Light Emitting Diodes Fabricated on SiO2/Si Wafers.", *p. L450, left hand col., last paragraph-right-hand col., pentultimate paragraph*.
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J. Cryst. Growth; vol. 55, 1981, pp. 223-228.

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