Light-emitting diode element and method for fabricating the...

Electric lamp and discharge devices – With luminescent solid or liquid material – Solid-state type

Reexamination Certificate

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C445S023000, C257S013000

Reexamination Certificate

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08063549

ABSTRACT:
A substrate for semiconductor device includes a graphite substrate, an amorphous carbon layer having a thickness of not less than 20 nm and not more than 60 nm formed on the graphite substrate and an AlN layer formed on the amorphous carbon layer. The amorphous carbon layer is obtained by oxidizing the surface of the graphite substrate.

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patent: 5895938 (1999-04-01), Watanabe et al.
patent: 2008/0251798 (2008-10-01), Ogihara et al.
patent: 2010/0320450 (2010-12-01), Fujioka
patent: 9-283797 (1997-10-01), None
patent: 2008-263126 (2008-10-01), None
patent: 2009-200207 (2009-09-01), None
Taniyasu et al. “MOVPE growth of single-crystal hexagonal AIN on cubic diamond”, Journal of Crystal Growth Jan. 14, 2009.
Shuji Nakamura et al., “Superbright Green InGaN Single-Quantum-Well-Structure Light-Emitting Diodes,” Jpn. J. Appl. Phys. vol. 34 (1995) pp. L1332-L1335.

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