Light emitting device using nitride semiconductor and...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S013000, C257S079000, C257S096000, C257S103000, C257SE33029

Reexamination Certificate

active

10517819

ABSTRACT:
A nitride based 3-5 group compound semiconductor light emitting device comprising: a substrate; a buffer layer formed above the substrate; a first In-doped GaN layer formed above the buffer layer; an InxGa1—xN/InyGa1−yN super lattice structure layer formed above the first In-doped GaN layer; a first electrode contact layer formed above the InxGa1—xN/InyGa1−yN super lattice structure layer; an active layer formed above the first electrode contact layer and functioning to emit light; a second In-doped GaN layer; a GaN layer formed above the second In-doped GaN layer; and a second electrode contact layer formed above the GaN layer. The present invention can reduce crystal defects of the nitride based 3-5 group compound semiconductor light emitting device and improve the crystallinity of a GaN GaN based single crystal layer in order to improve the performance of the light emitting device and ensure the reliability thereof.

REFERENCES:
patent: 6266355 (2001-07-01), Sverdlov
patent: 6274399 (2001-08-01), Kern et al.
patent: 6479836 (2002-11-01), Suzuki et al.
patent: 6608330 (2003-08-01), Yamada
patent: 6657234 (2003-12-01), Tanizawa
patent: 6664560 (2003-12-01), Emerson et al.
patent: 6720570 (2004-04-01), Lee et al.
patent: 6830948 (2004-12-01), Koike et al.
patent: 6838705 (2005-01-01), Tanizawa
patent: 6849864 (2005-02-01), Nagahama et al.
patent: 6906352 (2005-06-01), Edmond et al.
patent: 6958497 (2005-10-01), Emerson et al.
patent: 10-4210 (1998-01-01), None
patent: 10-214999 (1998-08-01), None
patent: 10-303458 (1998-11-01), None
patent: WO-03/073484 (2003-09-01), None
X.H. Zheng, “Effects of TMIn flow rate of barrier layer on the optical and structural properties of InxGa1−xN/InyGa1−yN multiple quantum wells” Journal of Crystal Growth, vol. 257, Issues 3-4, Oct. 2003, (received May 26, 2003), pp. 326-332.
S. Keller, “Growth and Properties on InGaN nanoscale islands on GaN” Journal of Crystal Growth, vols. 189-190, Jun. 15, 1998, pp. 29-32.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Light emitting device using nitride semiconductor and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light emitting device using nitride semiconductor and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light emitting device using nitride semiconductor and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3775769

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.