Light-emitting device and method for manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

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Details

C257S022000, C257S097000, C257S190000, C438S047000

Reexamination Certificate

active

06847046

ABSTRACT:
A light-emitting device and a method for manufacturing the same are described, by forming a SiN/Al1-x-yInxGayN(0≦x≦1, 0≦y≦1, x+y≦1) superlattice layer between a substrate and an undoped GaN as a buffer layer, so as to reduce dislocation density of the buffer layer. In the SiN/Al1-x-yInxGayN(0≦x≦1, 0≦y≦1, x+y≦1) superlattice layer, Al1-x-yInxGayN(0≦x≦1, 0≦y≦1, x+y≦1) can be n-type, p-type or undoped.

REFERENCES:
patent: 4863245 (1989-09-01), Roxlo
patent: 5576579 (1996-11-01), Agnello et al.
patent: 6078133 (2000-06-01), Menu et al.
patent: 6475882 (2002-11-01), Sakai et al.

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