Light-emitting device and manufacturing method thereof

Details Light-emitting device and manufacturing method thereof Light-emitting device and manufacturing method thereof

2011-07-26

2011-07-26

Pham, Thanh V (Department: 2894)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

C438S029000

Reexamination Certificate

active

07985605

ABSTRACT:
A first conductive film, a first insulating film, a semiconductor film, an impurity semiconductor film, and a second conductive film are stacked in this order (a thin-film stacked body); first etching is performed to expose the first conductive film and form at least a pattern of the thin-film stacked body; second etching is performed to form a pattern of the first conductive film. The second etching is performed under a condition in which the first conductive film is side-etched. Further, after forming the patterns, an EL layer can be formed selectively by utilizing a depression and a projection due to the patterns.

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