Coating processes – Direct application of electrical – magnetic – wave – or... – Photoinitiated chemical vapor deposition
Patent
1994-06-13
1995-09-12
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Photoinitiated chemical vapor deposition
427584, 427250, 427109, 427595, 427596, B05D 306
Patent
active
054495350
ABSTRACT:
A method is disclosed for depositing a substance on a substrate, including the following steps: providing the substrate in a deposition chamber, providing in the chamber a vapor of the substance, providing a buffer gas in the chamber, and directing a light beam at the substrate to control deposition of the substance by causing light induced drift.
REFERENCES:
Kleinfeld et al, "Light-controlled vapor deposition by light-induced drift", Appl. Phys. Lett. 62(24) 1993, p. 3077-3079.
S. N. Atutov and A. M. Shalagin, Opt. Commun. 83, 307, 1991, pp. 3-11.
P. C. Johnson, Plating and Surface Finishing, Jun. 1989, pp. 30-33.
J. Lamier, "Developments in the Deposition of Hard Coatings by Plasma-Based Techniques", Vaccum, vol. 40, No. 1,2, pp. 27-32, 1990.
K. Upadhya and T. C. Tierney, "Plasma Techniques for the Surface modification and Synthesis of Novel Materials", JOM, pp. 6-10, 1989.
D. T. Mugglin and A. D. Streater, "Momentum Transport Cross Sections For Excited and Ground State Potassium With Rare Gases by Light Induced Diffusive Pulling", J. Phys.B. Atom, Molec. and Optical Physics, vol. 26, No. 4 pp. 689-704 (1993).
A. Streater and J. P. Woerdman, "Strong Collision Model for Light-Induced Drift of Multi-Level Atoms", J. Phys. B: At. and Mol. Phys. 22, pp. 677-691 (1989).
F.Kh. Gel'mukhanov and A. M. Shalagin, Pis'ma Zh. Eksp. Teor. Fiz. 29, 773 (1979) [JEPT Lett. 29,711 (1979)].
F.Kh. Gel'mukhanov and A. M. Shalagin, Pis'ma Zh. Eksp. Teor. Fiz. 77,773 (1979) [Sov.Phys. JEPT 50,234 (1979)].
D. T. Mugglin, A. D. Streaker, S. Balle and K. Bergman, "Observation of White Light Induced Separation of Rb Isotopes" Optics Communications, vol. 104, pp. 165-174, Dec. 15, 1993.
A. D. Streater, J. Mooibroek and J. P. Woerdman, "Light-Induced Drift in Rubidium: Spectral Dependence and Isotope Separation", Opt. Commun. 64(2), 137-143 (1987).
Hermans, L. J. F. "Light-induced kinetric effects in molecular gases" International Reviews in Physical Chemistry, 1992, vol. 11. No.2, 289-315.
McGraw-Hill Encyclopedia of Science & Technology, vol. 19 ULC-ZYG, 7th Edition pp. 165-169.
Competitive Technologies Inc.
King Roy V.
Novack Michael R.
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