Ligands for improving metal chelate formation kinetics

Details Ligands for improving metal chelate formation kinetics Ligands for improving metal chelate formation kinetics

1992-02-06

1994-05-10

Stoll, Robert L.

Drug, bio-affecting and body treating compositions

Radionuclide or intended radionuclide containing; adjuvant...

In an organic compound

534 10, 534 14, 564153, 564154, 548548, 549472, 549475, 546261, 546264, 546290, 546300, 560147, 560169, 562556, A61K 4902, A61K 4300

Patent

active

053105362

ABSTRACT:
Amide-thiolate ligands having improved metal chelate formation kinetics are disclosed. The ligands include a tertiary amine strategically located to facilitate rapid formation of an amine-amide-thiolate intermediate complex, followed by transfer of the metal to a thermodynamically stable amide-thiolate complex. The amide-thiolate ligands of the present invention may be used for post formed labeling of biological substances for use in the fields of diagnosis and therapy.

REFERENCES:
patent: 4638051 (1987-01-01), Burns et al.
patent: 5071636 (1991-12-01), Yamauchi et al.
patent: 5075099 (1991-12-01), Srinivasan et al.
patent: 5095111 (1992-03-01), Lever et al.
patent: 5136038 (1992-08-01), Bodor
patent: 5202451 (1993-04-01), Fritzberg et al.
Gustavson et al., "Synthesis of a New Class of Tc Chelating Agents: N.sub.2 S.sub.2 Monoaminemonoamide (MAMA) Ligands" Tetrahedron Letters, vol. 32, No. 40, pp. 5485-5488, 1991.
Bryson, N, et al., Inorganic Chemistry, vol. 29, No. 16, Aug. 1990.
Misra et al., "Synthesis of a Novel Diaminodithiol Ligand for Labelling Proteins and Small Molecules with Technetium-99m", Tetrahedron Letters, vol. 30, No. 15, pp. 1885-1888, 1989.
Baidoo et al., "Synthesis of a Diaminedithiol Bifunctional Chelating Agent for Incorporation of Technetium-99m into Biomolecules", Bioconjugate Chem., vol. 1, pp. 132-137, 1990.
Rao et al., "Tc-Complexation of N.sub.2 S.sub.2 Monoaminemonoamides", Pre-publication draft.

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