Lifting and supporting device

Details Lifting and supporting device Lifting and supporting device

2002-07-15

2010-02-16

Ahmed, Shamim (Department: 1792)

Etching a substrate: processes

Gas phase etching of substrate

C216S067000, C118S715000, C156S345100

Reexamination Certificate

active

07662302

ABSTRACT:
The invention relates to a lifting and supporting device for handling and positioning particularly large-surface elements in the shape of panels, especially in plasma processing installations. Said lifting and supporting device comprises a particularly metallic base plate, on which a plurality of particularly dielectric pins are arranged. Said pins may be set in pin holes especially provided in the base plate. Said panel-shaped element may be positioned on the pin end for the handling thereof or during a plasma processing. Said panel-shaped element may present an electrostatic charge. A small diameter for the pins and pin holes is selected such that, in conformity with the panel-shaped element provided with the electrostatic charge, an undesired electrostatic charge on said panel-shaped element is essentially avoided or, in conformity with the panel-shaped element to be plasma processed, a plasma perturbation in the area of the pin holes or pins is essentially avoided.

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