Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1981-09-28
1983-06-07
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430314, 430323, 430324, 156628, 156643, 156652, 156653, 156655, 156657, G03C 500, G03F 500, B44C 122
Patent
active
043871453
ABSTRACT:
A method for forming a predetermined configuration of a film material comprises the steps of forming a layer of a first material on a surface, forming a layer of a second material on the first material wherein the first material has an etch rate greater than that of the second material when the first material and the second material are exposed to a common etchant, etching portions of the second material and underlying portions of the first material to expose portions of the surface, forming a layer of film material on the exposed portions of the surface, forming a layer of film material on the exposed portions of the surface and on the remaining portions of the second material, and removing the remaining portions of the first material such that the overlying second material and the film material thereon is also removed.
REFERENCES:
patent: 3669661 (1972-06-01), Page et al.
patent: 4108717 (1978-08-01), Widmann
patent: 4307179 (1981-12-01), Chang et al.
Lehrer William I.
Vincak John H.
Fairchild Camera & Instrument Corp.
Olsen Kenneth
Park Theodore S.
Pollock Michael J.
Schilling Richard L.
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