Lift-off method and chemical liquid tank

Details Lift-off method and chemical liquid tank Lift-off method and chemical liquid tank

2005-11-08

2005-11-08

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

With treating fluid motion

C216S040000, C438S906000

Reexamination Certificate

active

06962630

ABSTRACT:
A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off procedure. A wafer having a surface on which a pattern is formed which contains a pattern portion to be removed is soaked into a chemical liquid at an angle at which the surface faces downward.

REFERENCES:
patent: 5908042 (1999-06-01), Fukunaga et al.
patent: 05-062962 (1993-03-01), None
patent: 10-004093 (1998-01-01), None

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