Library accuracy enhancment and evaluation

Details Library accuracy enhancment and evaluation Library accuracy enhancment and evaluation

2007-11-28

2009-11-10

Dunn, Drew A (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Measured signal processing

C702S081000, C356S369000, C356S394000, C356S600000

Reexamination Certificate

active

07617075

ABSTRACT:
The accuracy of a library of simulated-diffraction signals for use in optical metrology of a structure formed on a wafer is evaluated by utilizing an identity relationship inherent to simulated diffraction signals. Each simulated diffraction signal contains at least one set of four reflectivity parameters for a wavelength and/or angle of incidence. One of the four reflectivity parameters is selected. A value for the selected reflectivity parameter is determined using the identity relationship and values of the remaining three reflectivity parameters. The determined value for the selected reflectivity parameter is compared to the value in the obtained set of four reflectivity parameters to evaluate and improve the accuracy of the library. The identity relationship can also be used to reduce the data storage in a library.

REFERENCES:
patent: 6943900 (2005-09-01), Niu et al.
patent: 7031894 (2006-04-01), Niu et al.
patent: 7092110 (2006-08-01), Balasubramanian et al.
patent: 7302367 (2007-11-01), Li et al.
patent: 2004/0267397 (2004-12-01), Doddi et al.
patent: 2005/0209816 (2005-09-01), Vuong et al.

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