Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-10-20
2009-12-15
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07632613
ABSTRACT:
A Levenson type phase shift mask has a light shielding portion and openings formed on a transparent substrate. The transparent substrate at the openings is partially dug in or a transparent film is partially disposed on the transparent substrate at the openings to form shifter openings and non-shifter openings. The shifter openings and the non-shifter openings repetitively exist in the mask. The shifter openings invert a phase of transmitted light. The Levenson type phase shift mask has a light shielding portions pattern interposed from both sides between the adjacent openings of the same kind. The light shielding portions pattern is subjected to bias correction which expands the light shielding portions pattern to both sides thereof in a predetermined amount with respect to a predetermined design line width set by a design of the mask.
REFERENCES:
patent: 6458495 (2002-10-01), Tsai et al.
patent: 7067221 (2006-06-01), Mesuda et al.
patent: 2003/0226819 (2003-12-01), Tzu et al.
patent: 2003/0229879 (2003-12-01), Pierrat
patent: 63-293822 (1988-11-01), None
patent: 5-11433 (1993-01-01), None
patent: 5-53290 (1993-03-01), None
patent: 10-333316 (1998-12-01), None
patent: 2000-187315 (2000-07-01), None
patent: 2003-177511 (2003-06-01), None
patent: 2003-344987 (2003-12-01), None
International Preliminary Report on Patentability, dated Oct. 25, 2006, PCT/IB/338, 373 and PCT/ISA/237.
European Search Report issued on Dec. 12, 2008 in corresponding European Patent Application 05734659.5.
Kojima Yosuke
Konishi Toshio
Otaki Masao
Sasaki Jun
Tanaka Keishi
Rosasco Stephen
Toppan Printing Co. Ltd.
LandOfFree
Levenson type phase shift mask and manufacturing method thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Levenson type phase shift mask and manufacturing method thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Levenson type phase shift mask and manufacturing method thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4069763