Levelling device in an exposure apparatus

Details Levelling device in an exposure apparatus Levelling device in an exposure apparatus

1989-07-12

1991-03-12

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

356400, G03B 2742

Patent

active

049996690

ABSTRACT:
An exposure apparatus for forming a pattern of a mask on a photo-sensitive substrate comprises an X-Y stage, a Z-stage supported on the X-Y stage, and a levelling stage that supports the photo-sensitive substrate. The levelling stage is supported on the Z-stage by a plurality of levelling devices that define a levelling reference plane, and that are operated in unison to change the level of the levelling stage relative to the Z-stage and relative to an exposure reference plane that is parallel to the levelling reference plane. The levelling devices are also operated individually to change the inclination of the photo-sensitive substrate relative to the levelling reference plane and relative to the exposure reference plane. A focus detector controls the movement of the Z-stage and the in-unison movement of the levelling devices. An inclination detector controls the individual operation of the levelling devices. The net result is that the surface of the photo-sensitive substrate is made coincident with the exposure reference plane and the levelling reference plane, and the center point of the surface of the photo-sensitive substrate becomes the pivotal center for changes in inclination of the photo-sensitive substrate.

REFERENCES:
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4770531 (1988-09-01), Tanaka et al.

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