Leveling a measured height profile

Details Leveling a measured height profile Leveling a measured height profile

2005-08-09

2005-08-09

Raevis, Robert (Department: 2856)

Measuring and testing

Surface and cutting edge testing

Roughness

C073S001790

Reexamination Certificate

active

06925860

ABSTRACT:
The height profile of a sample that includes at least one film on a substrate is leveled based on the measured thickness of the overlying film. An apparatus that levels the height profile includes a metrology tool that generates the height profile of a sample and a metrology tool that measures the thickness of one or more layers of a film stack on top of a substrate at two or more locations. The measured thickness is then used to level the height profile to reduce any tilt error before a step height calculation is made. For example, the slope of the thickness between two or more measurement points may be used to adjust the height profile. Once the height profile is leveled, step heights may be calculated with reduced tilting error.

REFERENCES:
patent: 2000-260840 (2000-09-01), None

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