Etching a substrate: processes – Forming or treating optical article – Lens
Patent
1995-06-07
1999-03-09
Nuzzolillo, Maria
Etching a substrate: processes
Forming or treating optical article
Lens
216 41, G02B 604
Patent
active
058795715
ABSTRACT:
A method for forming lensed ends on waveguides to within very fine tolerances is applicable to many types of waveguides, including single fibers and POWs. The method uses photolithographic materials and techniques, but uses the waveguides themselves to provide the exposing radiation. Thus a method for forming a lens on the end of a waveguide having a waveguiding region and a cladding region includes the step of coating a first end of the waveguide with a photoresist material having sensitivity to at least light in a particular wavelength range. Light in that particular wavelength range is then injected into a second end of the waveguide so that the light within the waveguiding region preferentially exposes the photoresist that covers the waveguiding region at the first end of the waveguide. The method can be carried out with either positive photoresist (where only the exposed portion is removed by development) or negative photoresist (where only the exposed portion remains after development).
REFERENCES:
patent: 4338352 (1982-07-01), Bear et al.
patent: 5346583 (1994-09-01), Basavanhally
patent: 5518863 (1996-05-01), Pawluczyk
Kalman Robert F.
Maynard Ronald S.
Silva Edward R.
Nuzzolillo Maria
Optical Networks, Inc.
Weiner Laura
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