Optical: systems and elements – Lens – With support
Patent
1994-12-21
1997-02-11
Dzierzynski, Paul M.
Optical: systems and elements
Lens
With support
359350, 359809, 359894, 359507, 355 67, G02B 702
Patent
active
056026838
ABSTRACT:
A high-quality lens system (PL) is described, which system is rinsed with a gas having a low refractive index so as to reduce the influence of variations of ambient parameters on the optical behaviour. By adding a very small quantity of ozone to this gas, it is prevented that any deposit will be produced on the lens elements within the lens holder (PLH) as a result of decomposition of organic particles caused by UV radiation and precipitation of the decomposition products.
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H. L. Stover, "Optical Microlithography IV", Proceedings of SPIE--The International Society for Optical Engineering, vol. 538, Mar. 13-14, 1985, pp. 86-90.
Martens Jan W. D.
Straaijer Alexander
ASM Lithography
Dzierzynski Paul M.
Schaier Arthur G.
Schuberg Darren E.
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