Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-12-26
1992-06-23
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118729, 118731, C23C 1424, C23C 1434, C23C 1450
Patent
active
051240190
ABSTRACT:
A lens holder, particularly for eyeglass lenses to be coated in a high-vacuum vapor deposition or sputtering system, is formed as a ring pair. The ring pair is connectable to a substrate holder that is mounted in the process chamber of the high-vacuum system in the proximity of a coating source. The lens can be placed between the rings of the ring pair, which are secured to one another by resilient wires. An outer surface of a first ring is provided with ramps that interact with resilient wires that are secured to the outer surface of a second ring. One of the rings includes two diametrically opposite pegs which serve to pivotably mount the lens holder in bearing forks mounted on the substrate holder. The lens holder is capable of 180.degree. of rotation.
REFERENCES:
patent: 4473455 (1984-09-01), Dean et al.
patent: 4592308 (1986-06-01), Shih et al.
patent: 4735701 (1988-04-01), Allen et al.
J. W. Brossman et al., Apparatus for Depositing Material on Both Side of Semiconductor Slices, Western Electric, Technical Digest No. 7, Jul. 1967, pp. 7-8.
Fliedner Michael
Klingenstein Dieter
Kunkel Georg
Mahr Heinz
Leader William T.
Leybold Aktiengesellschaft
Niebling John
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