Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
1999-10-07
2008-03-18
Vanore, David (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492100, C250S3960ML
Reexamination Certificate
active
07345290
ABSTRACT:
A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.
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“Mesh equipped Wehnelt source for SCALPEL”, Katsap, Waskiewicz, Sewell, and Rouse, SPIE, vol. 3777, pp. 75-81.
Katsap Victor
Kruit Pieter
Moonen Daniel
Waskiewicz Warren Kazmir
Agere Systems Inc
Vanore David
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