Led array fabrication process with improved unformity

Details Led array fabrication process with improved unformity Led array fabrication process with improved unformity

1996-03-06

1998-03-31

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430313, G03F 900

Patent

active

057336890

ABSTRACT:
A method of fabricating an LED array includes (a) forming a first insulating film composed of aluminum oxide on a semiconductor substrate of a first conductive type; (b) patterning the first insulating film by photolithography to form a plurality of first windows; (c) diffusing an impurity of a second conductive type through the plurality of first windows into the first insulating film, thereby forming a plurality of diffusion regions of the second conductive type below the plurality of first windows; (d) forming a second insulating film on the first insulating film and the plurality of first windows; (e) patterning the second insulating film by photolithography to remove the second insulating film from the plurality of first windows, using an etchant that does not etch the first insulating film; (f) forming a metal film on the second insulating film and the plurality of first windows; and (g) patterning the metal film by photolithography to form a plurality of electrodes which make electrical contact with respective diffusion regions.

REFERENCES:
patent: 3730766 (1973-05-01), Nishimatsu et al.
patent: 3745428 (1973-07-01), Misawa et al.
patent: 4127792 (1978-11-01), Nakata
patent: 4145707 (1979-03-01), Sadamasa et al.
patent: 4277793 (1981-07-01), Webb
patent: 4852112 (1989-07-01), Kagawa et al.
patent: 5309001 (1994-05-01), Watanabe et al.
Nakamura et al., "Kotai Hakko Soshi to sono Oyo (Solid-State Light-Emitting Elements and their Applications)", Sampo, 1971, pp. 78-81.
Hashimoto et al., "Purazuma CVD SiOxNy Maku wo Mochiita Zn Sentaku Kakusan Gijutsu no Kaihatsu" (Development of Selective Zinc Diffusion Technology Using Plasma CVD SiOxNy Film), Oki Denki Kenkyu Kaihatsu (Oki Research and Development), vol. 52, No. 4, pp. 105-110, Oct. 1985.

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