Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1987-05-27
1988-11-22
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041823, 2041824, B01D 1302
Patent
active
047863935
ABSTRACT:
An improved electrodialysis stack and method of making the same wherein the border surface areas of the flow spacer frames are microroughened, as by chemical etching, sandblasting, with a patterned mold or embossing, the peripheral inner edges of the frame border are machined smooth, the microroughened border surface areas are coated with a thin layer of inert grease such as silicone, and placed under pressure with other electrodialysis components to form a closed system closely packed and essentially solid stack which is free from cross leakage between compartments and seepage therefrom.
REFERENCES:
patent: 2923676 (1960-02-01), Deming
patent: 3933617 (1976-01-01), Yamamoto et al.
patent: 4600493 (1986-07-01), Korngold
Morton Thiokol Inc.
Niebling John F.
Starsiak Jr. John S.
White Gerald K.
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