Leak detection system for a gas manifold of a chemical vapor dep

Details Leak detection system for a gas manifold of a chemical vapor dep Leak detection system for a gas manifold of a chemical vapor dep

1995-08-28

1997-03-25

Lusignan, Michael

Coating processes

Measuring, testing, or indicating

738659, 118715, 118733, B05D 300

Patent

active

056142498

ABSTRACT:
A chemical vapor deposition apparatus includes a gas manifold having a first gas flow port through which a gas flow path extends, and a first peripheral surface which extends about the first gas flow port. The chemical vapor deposition apparatus further includes a second gas flow port through which the gas flow path extends, and a second peripheral surface extending about the second gas flow port. A connection of the gas manifold is provided such that the first and second peripheral surfaces substantially mutually engage intended for providing a substantial seal of the gas flow path. A groove is provided in at least one of the first and second peripheral surfaces and extends so as to communicate with at least one of the first and second gas flow ports. The groove facilitates flow of a test gas therein from outside the chemical vapor deposition apparatus towards the respective gas flow port.
A method for checking seals of a chemical vapor deposition apparatus gas manifold includes providing groove in a least one of a pair of mutually engaging peripheral surfaces which surround a gas flow port through which a gas flow path of the gas manifold extends. The groove extends so as to communicate with the gas flow port for facilitating flow of a test gas in the groove. A vacuum is drawn in the gas mixing manifold while a test gas is provided in an area proximate the gas manifold seal, and the entrance of the test gas inside the gas flow path through the seal is detected in order to determine the reliability of the seal.

REFERENCES:
patent: 5233861 (1993-08-01), Gore et al.
patent: 5362526 (1994-11-01), Wang et al.
patent: 5498578 (1996-03-01), Steele et al.

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