Leak detection method and apparatus for plasma processing equipm

Radiant energy – Invisible radiant energy responsive electric signalling – Ultraviolet light responsive means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G01N 2173

Patent

active

057897549

ABSTRACT:
In one aspect, a method of detecting leaks of external atmospheric gases into a plasma reactor comprises monitoring an emission spectra of a plasma within the reactor for the presence of an external atmospheric constituent. In another aspect, a method of detecting an external atmospheric leak in a plasma enhanced reactor comprising detecting photon emission of excited nitrogen present within the reactor. In yet another aspect, a leak detection system of continuously detecting for leaks of external atmospheric gases into a plasma reactor comprises: a) an optical detection apparatus in optical communication with a plasma in the plasma reactor; b) the optical detection apparatus being configured to monitor an emission spectra of the plasma for a signal due to presence of an external atmospheric constituent within the plasma and for a signal due to a non-atmospheric constituent within the plasma; and c) an alarm configured to generate a response when the relative size of the external atmospheric constituent signal to the non-atmospheric constituent signal exceeds a predetermined value.

REFERENCES:
patent: 5326975 (1994-07-01), Barna

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Leak detection method and apparatus for plasma processing equipm does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Leak detection method and apparatus for plasma processing equipm, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Leak detection method and apparatus for plasma processing equipm will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1179760

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.