Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Patent
1997-11-25
2000-06-13
Bowers, Charles
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
438240, H01L 2994, H01L 21314
Patent
active
060748850
ABSTRACT:
A method for constructing a device having a bottom electrode in contact with a layer of a ferroelectric dielectric material. In the method of the present invention, a layer of a field ferroelectric material is deposited on a substrate and etched to form a trench in which the bottom electrode is constructed. The bottom electrode is then deposited and a layer of the ferroelectric dielectric material is deposited over the bottom electrode and at least a portion of the field ferroelectric material. The ferroelectric layers are deposited in a perovskite state. These layers are etched back to the substrate in those areas that are outside of the device.
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Boyer Leonard L.
Evans, Jr. Joseph T.
Velasquez Naomi B.
Bowers Charles
Radiant Technologies, Inc
Ward Calvin B.
Whipple Matthew
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