LCD TFT having two layer region adjacent base region in which th

Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal

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349151, 257 59, 257 72, 257349, G02F 1136, G02F 11345, H01L 2904, H01L 2701

Patent

active

057106061

ABSTRACT:
A polycrystalline silicon active layer is provided on a transparent insulating substrate. Phosphorus is ion-implanted into the active layer, to form a pair of n-type source/drain regions with a base region interposed therebetween. In this ion-implantation, a density gradient of phosphorus is formed in the thicknesses direction of the active layer. Boron is ion-implanted into each of the source/drain regions, to be adjacent to the base region. In this ion-implantation, a density gradient of boron is formed, and the position providing a maximum density of boron is set to be deeper than the position which provides a maximum density of phosphorus. By the ion-implantation of boron, an n-type LDD portion having a high resistance and a p-type portion are formed on the upper and lower sides, respectively, adjacent to the base region within each of the source/drain regions.

REFERENCES:
patent: 4764477 (1988-08-01), Chang et al.
patent: 5412493 (1995-05-01), Kunii et al.
patent: 5530266 (1996-06-01), Yonehara et al.
patent: 5574292 (1996-11-01), Takahashi et al.

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