LCD device including semiconductor of nano material and...

Liquid crystal cells – elements and systems – Nominal manufacturing methods or post manufacturing...

Reexamination Certificate

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Details

C349S043000, C438S149000, C427S058000

Reexamination Certificate

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07920246

ABSTRACT:
An LCD device and a method for fabricating the same are disclosed. The LCD device includes a substrate having a pixel region. A gate electrode is formed in the pixel region. A gate insulating film is formed on the substrate including the gate electrode. A conducting layer is formed on the substrate including the gate insulating film. A semiconductor layer containing a nanosemiconductor material is formed on the conducting layer above the gate electrode. Source and drain electrodes overlap opposing sides of the semiconductor layer. A passivation layer is formed on the substrate including the source and drain electrodes. A first contact hole in the passivation layer exposes the drain electrode. A pixel electrode in the pixel region is connected to the drain electrode through the first contact hole.

REFERENCES:
patent: 6411346 (2002-06-01), Numano et al.
patent: 2001/0001288 (2001-05-01), Tomoyori et al.
patent: 2001/0023046 (2001-09-01), Nihei
patent: 2006/0134392 (2006-06-01), Hantschel et al.
patent: 2006/0211183 (2006-09-01), Duan et al.

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